Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process and arrangement for copying masks on a workpiece with arrangement for correction of alignment errors

Process and arrangement for copying masks on a workpiece with arrangement for correction of alignment errors

US Patent 4362385 · Granted Dec 7, 1982

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Interferometer gas flow system1992
Device for the projection copying of masks onto a workpiece1986
Device for the projection copying of masks1986
Device for the projection printing of masks into a workpiece1985
Apparatus for the photolithographic manufacture of integrated circuit elements1985
Process for transferring a pattern onto a semiconductor disk1983
Arrangement for projection copying masks on to a work piece1982
Photolithographic method for the manufacture of integrated circuits1982