Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Surface modification to achieve selective isotropic etch

Surface modification to achieve selective isotropic etch

US Patent 12512327 · Granted Dec 30, 2025

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Etch selectivity modulation by fluorocarbon treatment2025
Etch selectivity modulation by fluorocarbon treatment2025
Self-aligned method for vertical recess for 3D device integration2025
Selective and isotropic etch of silicon over silicon-germanium alloys and dielec2025
Selective and isotropic etch of silicon over silicon-germanium alloys and dielec2025
Selective and isotropic etch of silicon over silicon-germanium alloys and dielec2025
Selective and isotropic etch of silicon over silicon-germanium alloys and dielec2025
Substrate processing with selective etching2025
Substrate processing with material modification and removal2025
Methods of forming stacked integrated circuits using selective thermal atomic la2024
Lateral etching of silicon2024
Plasma etching techniques2023