Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process characterization and correction using optical wall process sensor (OWPS)

Process characterization and correction using optical wall process sensor (OWPS)

US Patent 12467136 · Granted Nov 11, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Physically-informed multi-system hardware operating windows2025
Determining equipment constant updates by machine learning2025
Chamber matching by equipment constant updates2025
In-situ etch rate and etch rate uniformity detection system2025
Process characterization and correction using optical wall process sensor (OWPS)2025
Process characterization and correction using optical wall process sensor (OWPS)2025
Process characterization and correction using optical wall process sensor (OWPS)2025
Process characterization and correction using optical wall process sensor (OWPS)2025
Method for image-based sensor trace analysis2025
Machine learning model training2025
Transmission corrected plasma emission using in-situ optical reflectometry2025
Adaptive synchronization for automatic exposure control (AEC)2025