Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Substrate handling systems and methods for CMP processing

Substrate handling systems and methods for CMP processing

US Patent 12454036 · Granted Oct 28, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

In-situ conditioner disk cleaning during CMP2025
Chemical mechanical polishing vibration measurement using optical sensor2025
Retaining ring having inner surfaces with features2025
Cooling jacket for cooling permanent magnet synchronous electric motor2025
Heat exchanger with multistaged cooling2024
Automated dry-in dry-out dual side polishing of silicon substrates with integrat2024
Methods of detecting non-conforming substrate processing events during chemical 2024
Chemical mechanical polishing system with platen temperature control2024
Sequential application of cleaning fluids for improved maintenance of chemical m2023
Methods and apparatus for cleaning a substrate after processing2023
Edge load ring2022
Heat exchanger with multistaged cooling2022