Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Optical element, optical system, lithography system, and method for operating an optical element

Optical element, optical system, lithography system, and method for operating an optical element

US Patent 12436473 · Granted Oct 7, 2025

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Ground milling machine2024
Optical element having a coating for influencing heating radiation and optical a2024
Optical element having a coating for influencing heating radiation and optical a2024
Optical link and coherent receiver noise characterization2022
Projection exposure system for semiconductor lithography having an optical arran2022
Projection exposure system for semiconductor lithography having an optical arran2022
Projection exposure system for semiconductor lithography having an optical arran2022
Projection exposure system for semiconductor lithography having an optical arran2022
Optical element having a coating for influencing heating radiation and optical a2021
Optical element having a coating for influencing heating radiation and optical a2021
Imaging optical system for microlithography2020
Projection lens, projection exposure apparatus and projection exposure method fo2020