Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Introducing fluorine to gate after work function metal deposition

Introducing fluorine to gate after work function metal deposition

US Patent 12426332 · Granted Sep 23, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device2025
Semiconductor device and method of manufacture2025
Method for forming semiconductor structure using fluorine to treat gate stack2025
Semiconductor structure with enlarged gate electrode structure and method for fo2025
Incorporating nitrogen in dipole engineering for multi-threshold voltage applica2024
Gate structure and method of fabricating the same2024
Introducing fluorine to gate after work function metal deposition2024
Introducing fluorine to gate after work function metal deposition2024
Gate structures in semiconductor devices2024
Method for manufacturing semiconductor device2023
Gate structures in semiconductor devices2023
Semiconductor device and method of manufacture2022