Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12426332 | Introducing fluorine to gate after work function metal deposition | Pei Ying Lai | 2025-09-23 |
| 12191366 | Semiconductor structure with enlarged gate electrode structure and method for forming the same | Wen-Jia Hsieh, Yi-Chun Lo, Mi-Hua Lin | 2025-01-07 |
| 12015068 | Gate structure and method of fabricating the same | Yi-Chun Lo, Wen-Jia Hsieh | 2024-06-18 |
| 11996453 | Introducing fluorine to gate after work function metal deposition | Pei Ying Lai | 2024-05-28 |
| 11848367 | Method for manufacturing semiconductor device | Wen-Hsin Chan | 2023-12-19 |
| 11296201 | Gate structure and method of fabricating the same | Yi-Chun Lo, Wen-Jia Hsieh | 2022-04-05 |
| 11038035 | Semiconductor structure with enlarged gate electrode structure and method for forming the same | Wen-Jia Hsieh, Yi-Chun Lo, Mi-Hua Lin | 2021-06-15 |
| 11018234 | Semiconductor device and manufacturing method thereof | Wen-Hsin Chan | 2021-05-25 |
| 10686049 | Gate structure and method of fabricating the same | Yi-Chun Lo, Wen-Jia Hsieh | 2020-06-16 |
| 10312338 | Gate structure and method of fabricating the same | Yi-Chun Lo, Wen-Jia Hsieh | 2019-06-04 |
| 10141416 | Semiconductor structure with enlarged gate electrode structure and method for forming the same | Wen-Jia Hsieh, Yi-Chun Lo, Mi-Hua Lin | 2018-11-27 |
| 10008574 | Gate structure and method of fabricating the same | Wen-Jia Hsieh, Yi-Chun Lo | 2018-06-26 |
| 9748350 | Semiconductor structure with enlarged gate electrode structure and method for forming the same | Wen-Jia Hsieh, Yi-Chun Lo, Mi-Hua Lin | 2017-08-29 |