Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12426332 | Introducing fluorine to gate after work function metal deposition | Bo-Wen Hsieh | 2025-09-23 |
| 12376364 | Semiconductor device and method of manufacture | Chia-Wei Hsu, Cheng-Hao Hou, Xiong-Fei Yu, Chi On Chui | 2025-07-29 |
| 12336273 | Method for forming semiconductor structure using fluorine to treat gate stack | Chia-Wei Hsu, Tsung-Da Lin, Chi On Chui | 2025-06-17 |
| 12040365 | Incorporating nitrogen in dipole engineering for multi-threshold voltage applications in stacked device structures | Cheng-Chieh Lin, Hsueh-Ju Chen, Tsung-Da Lin, Cheng-Hao Hou, Chi On Chui | 2024-07-16 |
| 11996453 | Introducing fluorine to gate after work function metal deposition | Bo-Wen Hsieh | 2024-05-28 |
| 11915979 | Gate structures in semiconductor devices | Chia-Wei Hsu, Cheng-Hao Hou, Xiong-Fei Yu, Chi On Chui | 2024-02-27 |
| 11756832 | Gate structures in semiconductor devices | Chia-Wei Hsu, Cheng-Hao Hou, Xiong-Fei Yu, Chi On Chui | 2023-09-12 |
| 11462626 | Semiconductor device and method of manufacture | Chia-Wei Hsu, Cheng-Hao Hou, Xiong-Fei Yu, Chi On Chui | 2022-10-04 |