Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask

Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask

US Patent 12339579 · Granted Jun 24, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

EUV pellicle and mounting method thereof on photo mask2025
Reticle container2025
Reticle container2025
Reticle container2025
Pellicle membrane with improved properties2025
Pellicle membrane with improved properties2025
Optical assembly with coating and methods of use2025
Optical assembly with coating and methods of use2025
Optical assembly with coating and methods of use2025
EUV photo masks and manufacturing method thereof2025
EUV photo masks and manufacturing method thereof2025
EUV photo masks and manufacturing method thereof2025