Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming thin dummy sidewall spacers for transistors with reduced pitches

Method of forming thin dummy sidewall spacers for transistors with reduced pitches

US Patent 12328929 · Granted Jun 10, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for forming semiconductor structure2025
Method for forming semiconductor structure2025
Method for forming semiconductor structure2025
Vertical grating filters for photonics2025
Semiconductor device structure and method for forming the same2025
Dielectric isolation structure for multi-gate transistors2025
Semiconductor device having isolation structure formed of low-k dielectric mater2025
Semiconductor device, FinFET device and methods of forming the same2025
Semiconductor device, FinFET device and methods of forming the same2025
FinFET device and method of forming same2025
Reflectors applied to photonics platforms2025
Cut metal gate refill with void2025