Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Reflective mask blank for EUV lithography and substrate with conductive film

Reflective mask blank for EUV lithography and substrate with conductive film

US Patent 12235575 · Granted Feb 25, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Ophthalmic apparatus, method of controlling the same, and recording medium2025
Ophthalmologic device and method for controlling same2025
Method for designing semiconductor integrated circuit, circuit design system, an2025
Reflective mask blank for EUV lithography and substrate equipped with conductive2025
Reflective mask blank, reflective mask, method of manufacturing reflective mask 2025
Reflective mask blank for EUV lithography, reflective mask for EUV lithography, 2025
Ophthalmic apparatus, method of controlling the same, and recording medium2025
Reflective mask blank for EUV lithography, mask blank for EUV lithography, and m2025
Reflective mask blank and reflective mask2025
Reflective mask blank and reflective mask2024
Reflective mask blank for EUV lithography2024
Reflective mask blank for EUV lithography2024