Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Deposition of iodine-containing carbon films

Deposition of iodine-containing carbon films

US Patent 12188123 · Granted Jan 7, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Mechanism to manage bidirectional traffic for high availability network devices2025
Method for rapid on-site detection of fentanyl analogs using a miniature mass sp2025
Etching methods with alternating non-plasma and plasma etching processes2025
Etching methods with alternating non-plasma and plasma etching processes2025
Etching gas mixture and method of manufacturing integrated circuit device using 2025
Method to improve profile control during selective etching of silicon nitride sp2025
Method to improve profile control during selective etching of silicon nitride sp2025
Oxygen and iodine-containing hydrofluorocarbon compound for etching semiconducto2025
Method of running an etch process in higher selectivity to mask and polymer regi2025
Method of running an etch process in higher selectivity to mask and polymer regi2025
Silicon-based self-assembling monolayer compositions and surface preparation usi2025
Methods of using substituted pyrazole and pyrazole compounds and for treatment o2024