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Home › Method for measuring an effect of a wavelength-dependent measuring light reflectivity and an effect of a polarization of measuring light on a measuring light impingement on a lithography mask

Method for measuring an effect of a wavelength-dependent measuring light reflectivity and an effect of a polarization of measuring light on a measuring light impingement on a lithography mask

US Patent 12174546 · Granted Dec 24, 2024

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