Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures

Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures

US Patent 12106965 · Granted Oct 1, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and system for depositing transition metal carbide2025
Method and system for depositing noble metal-containing layer2025
Synthesis and use of precursors for ALD of molybdenum or tungsten containing thi2025
Synthesis and use of precursors for ALD of molybdenum or tungsten containing thi2025
Atomic layer deposition and etching of transition metal dichalcogenide thin film2025
Atomic layer deposition and etching of transition metal dichalcogenide thin film2025
Area selective organic material removal2025
Area selective organic material removal2025
Deposition of transition metal—comprising material2025
Deposition of transition metal—comprising material2025
Method of forming a transition metal containing film on a substrate by a cyclica2024
Method of forming a transition metal containing film on a substrate by a cyclica2024