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Home › Method for an ion implantation process employing an ion-collecting device that collects a distribution of ejected ions from a target to correct a tilt angle of the target

Method for an ion implantation process employing an ion-collecting device that collects a distribution of ejected ions from a target to correct a tilt angle of the target

US Patent 12051593 · Granted Jul 30, 2024

Estimated economic value: $15,543,000 ⓘ

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