Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for removing a particle from a photolithographic mask

Method and apparatus for removing a particle from a photolithographic mask

US Patent 11899359 · Granted Feb 13, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method, device and computer program for repairing a mask defect2025
Device and method for operating a bending beam in a closed control loop2025
Method and apparatuses for disposing of excess material of a photolithographic m2025
Method and apparatuses for disposing of excess material of a photolithographic m2024
Methods and devices for extending a time period until changing a measuring tip o2024
Methods and devices for extending a time period until changing a measuring tip o2024
Device and method for operating a bending beam in a closed control loop2024
Apparatus and method for removing a single particulate from a substrate2024
Method and apparatuses for disposing of excess material of a photolithographic m2024
Apparatus and method for a scanning probe microscope2023
Device and method for analyzing a defect of a photolithographic mask or of a waf2023
Method and apparatus for examining a measuring tip of a scanning probe microscop2023