Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma processing system and method using radio frequency (RF) and microwave power

Plasma processing system and method using radio frequency (RF) and microwave power

US Patent 11887815 · Granted Jan 30, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Image display device configured to convert row display data into update instruct2025
Devices and methods for controlling wafer uniformity in plasma-based process2025
Method to selectively etch silicon nitride to silicon oxide using water crystall2025
Method for etching for semiconductor fabrication2025
Filter contamination measuring device, filter assembly including the same, and f2025
In-situ adsorbate formation for plasma etch process2025
Magnetic levitation rotor sail2025
Etch process for oxide of alkaline earth metal2025
Showerhead assembly with heated showerhead2024
Plasma processing system and method using radio frequency and microwave power2024
Plasma processing system and method using radio frequency and microwave power2024
Plasma processing system and method using radio frequency and microwave power2024