Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › In-situ adsorbate formation for plasma etch process

In-situ adsorbate formation for plasma etch process

US Patent 12308212 · Granted May 20, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Image display device configured to convert row display data into update instruct2025
Etching method and etching apparatus2025
Method for processing workpiece2025
Devices and methods for controlling wafer uniformity in plasma-based process2025
Storage box2025
Method to selectively etch silicon nitride to silicon oxide using water crystall2025
Method to selectively etch silicon nitride to silicon oxide using water crystall2025
Method to selectively etch silicon nitride to silicon oxide using water crystall2025
Etching method and plasma processing system2025
Plasma processing method and plasma processing system2025
Method for etching for semiconductor fabrication2025
Method for etching for semiconductor fabrication2025