Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for diffraction pattern guided source mask optimization

Method and apparatus for diffraction pattern guided source mask optimization

US Patent 11846889 · Granted Dec 19, 2023

Estimated economic value: $78,633,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for controlling a manufacturing process and associated apparatuses2025
Optimization using a non-uniform illumination intensity profile2025
Method for determining aberration sensitivity of patterns2025
Aberration impact systems, models, and manufacturing processes2025
Method of determining characteristic of patterning process based on defect for r2024
Wavefront optimization for tuning scanner based on performance matching2024
Imaging via zeroth order suppression2024
Flows of optimization for patterning processes2024
Method for high numerical aperture thru-slit source mask optimization2023
Method and apparatus for imaging using narrowed bandwidth2023
Method for optimizing a patterning device pattern2023
Wavefront optimization for tuning scanner based on performance matching2023