Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for high speed inspection of semiconductor substrates

System and method for high speed inspection of semiconductor substrates

US Patent 11749571 · Granted Sep 5, 2023

Estimated economic value: $7,739,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

PWM signal conversion circuit and method, and LED dimming system2025
In-situ apparatus for detecting abnormality in process tube2025
In-situ apparatus for detecting abnormality in process tube2025
In-situ apparatus for detecting abnormality in process tube2025
In-situ apparatus for detecting abnormality in process tube2025
Chemical mechanical polishing apparatus and method2025
Apparatus and methods for determining fluid dynamics of liquid film on wafer sur2025
Apparatus and methods for determining fluid dynamics of liquid film on wafer sur2025
Apparatus and methods for determining fluid dynamics of liquid film on wafer sur2025
Method and system for semiconductor wafer defect review2025
Method and system for semiconductor wafer defect review2025
Method and system for semiconductor wafer defect review2025