Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Particle removing assembly and method of cleaning mask for lithography

Particle removing assembly and method of cleaning mask for lithography

US Patent 11698592 · Granted Jul 11, 2023

Estimated economic value: $16,061,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Charging base2025
EUV pellicle and mounting method thereof on photo mask2025
Reticle container2025
Pellicle membrane with improved properties2025
Optical assembly with coating and methods of use2025
Electronic shelf label2025
Electronic shelf label having a lamp hole surface shell2025
Electronic shelf label having a lamp hole surface shell2025
Electronic shelf label having a lamp hole surface shell2025
EUV photo masks and manufacturing method thereof2025
Methods and systems for improving plasma ignition stability2025
High throughput and high position accurate method for particle inspection of mas2025