Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

US Patent 11630388 · Granted Apr 18, 2023

Estimated economic value: $130,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Mask blank, method of manufacturing transfer mask, and method of manufacturing s2025
Mask blank, method of manufacturing transfer mask, and method of manufacturing s2025
Reflective mask blank, reflective mask, and method for manufacturing semiconduct2025
Mask blank, method for manufacturing transfer mask, and method for manufacturing2024
Mask blank, method for manufacturing transfer mask, and method for manufacturing2024
Mask blank, method for manufacturing transfer mask, and method for manufacturing2024
Mask blank, transfer mask, and method for manufacturing semiconductor device2024
Mask blank, method of manufacturing imprint mold, method of manufacturing transf2024
Mask blank, method of manufacturing imprint mold, method of manufacturing transf2024
Mask blank, method of manufacturing imprint mold, method of manufacturing transf2024
Mask blank, method for manufacturing reflective mask, and method for manufacturi2023
Mask blank, method for manufacturing reflective mask, and method for manufacturi2023