Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Snapshot type overlay error measuring device and measuring method

Snapshot type overlay error measuring device and measuring method

US Patent 11619883 · Granted Apr 4, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for ptychography position correction based on probe weighting2025
Method for forming piezoelectric films on surfaces of arbitrary morphologies2023
Method and system for correcting lithography process hotspots based on stress da2023
Rapid measurement method for ultra-thin film optical constant2023
Rapid measurement method for ultra-thin film optical constant2023
Method for measuring dielectric tensor of material2023
Method for measuring dielectric tensor of material2023
Method and device for real-time attitude angle measurement based on field of vie2022
Optimization methods of polarization modulator and polarization measurement syst2021
Optimization methods of polarization modulator and polarization measurement syst2021
Material optical transition analysis method and system2021
Material optical transition analysis method and system2021