Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for spatially resolved optical metrology of an ion beam

System and method for spatially resolved optical metrology of an ion beam

US Patent 11380517 · Granted Jul 5, 2022

Estimated economic value: $35,888,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Managing metadata switches and platform licenses in a distributed system2025
Systems, methods, and devices for improved application program interface managem2025
Modifying patterned features using a directional etch2025
Defining feature variable configurations that enable access to features of a sys2025
Directional modification of patterning structure to enhance pattern elongation p2024
Intelligent contextual help chat in a multi-tenant database system2024
Automatic self-removal of sensitive data items2024
Contact passlisting across digital channels2024
Angled etch for surface smoothing2023
Methods for forming elongated contact hole ends2023
Real-time feature activation in distributed environment2023
Automated particle removal system having angular adjustability2022