Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and systems for inspection of wafers and reticles using designer intent data

Methods and systems for inspection of wafers and reticles using designer intent data

US Patent 11348222 · Granted May 31, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pellicle and pellicle assembly2024
Mask assembly and associated methods2023
Integrated multi-tool reticle inspection2023
Pellicle and pellicle assembly2022
Method and system for mixed mode wafer inspection2022
Guided patterning device inspection2022
Mask assembly and associated methods2021
Mask assembly and associated methods2021
Solar spectrum sensor for determining value of solar spectrum based on determine2021
Pellicle and pellicle assembly2021
Methods and systems for inspection of wafers and reticles using designer intent 2020
Methods and systems for inspection of wafers and reticles using designer intent 2020