Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus to enhance sheath formation, evolution and pulse to pulse stability in RF powered plasma applications

Method and apparatus to enhance sheath formation, evolution and pulse to pulse stability in RF powered plasma applications

US Patent 11315757 · Granted Apr 26, 2022

Estimated economic value: $46,183,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Non-invasive IED estimation for pulsed-DC and low frequency applications2025
Method and apparatus for plasma dicing a semi-conductor wafer2025
Adaptive pulse shaping with post match sensor2025
Adaptive pulse shaping with post match sensor2025
Enhanced tuning methods for mitigating RF load impedance variations due to perio2025
Extremum-seeking control apparatuses and methods for automatic frequency tuning2025
Apparatus and tuning method for mitigating RF load impedance variations due to p2024
Pulse and bias synchronization methods and systems2024
Extremum seeking control apparatuses with online parameter adjustment and method2024
Real-time, non-invasive IEDF plasma sensor2024
High speed synchronization of plasma source/bias power delivery2024
High speed synchronization of plasma source/bias power delivery2024