Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Automatic feature extraction from aerial images for test pattern sampling and pattern coverage inspection for lithography

Automatic feature extraction from aerial images for test pattern sampling and pattern coverage inspection for lithography

US Patent 11301748 · Granted Apr 12, 2022

Estimated economic value: $4,292,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Selective gas etching for self-aligned pattern transfer2025
Alternating hardmasks for tight-pitch line formation2025
Self aligned pattern formation post spacer etchback in tight pitch configuration2024
Self aligned pattern formation post spacer etchback in tight pitch configuration2023
Self-aligned pattern formation for a semiconductor device2023
Alternating hardmasks for tight-pitch line formation2023
Selective gas etching for self-aligned pattern transfer2022
Self-aligned pattern formation for a semiconductor device2022
Tight pitch via structures enabled by orthogonal and non-orthogonal merged vias2021
Thickening cleansing compositions and applications and methods of preparation th2021
Alternating hardmasks for tight-pitch line formation2021
Self aligned pattern formation post spacer etchback in tight pitch configuration2021