Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for residual voltage control of electrostatic chucking assemblies

System and method for residual voltage control of electrostatic chucking assemblies

US Patent 11024529 · Granted Jun 1, 2021

Estimated economic value: $74,932,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Roll-aboard travel bag2024
Detachable biasable electrostatic chuck for high temperature applications2024
Reactive cleaning of substrate support2023
Gas diffusion shower head design for large area plasma enhanced chemical vapor d2023
RF choke for gas delivery to an RF driven electrode in a plasma processing appar2022
Base plate for a processing chamber substrate support2022
Roll-aboard garment bag2022
Base plate for a processing chamber substrate support2022
RF choke for gas delivery to an RF driven electrode in a plasma processing appar2021
Base plate for a processing chamber substrate support2020
Flip edge shadow frame2020
Full-area counter-flow heat exchange substrate support2020