Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sequential infiltration synthesis extreme ultraviolet single expose patterning

Sequential infiltration synthesis extreme ultraviolet single expose patterning

US Patent 10998192 · Granted May 4, 2021

Estimated economic value: $7,263,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Vertically stacked fin semiconductor devices2025
Solvent annealing of an organic planarization layer2025
Fabrication of embedded memory devices utilizing a self assembled monolayer2025
Photovoltaic devices with textured TCO layers, and methods of making TCO stacks2025
Alternating hardmasks for tight-pitch line formation2025
Dielectric reflow for boundary control2025
Dielectric reflow for boundary control2025
Dielectric reflow for boundary control2025
Multi-layer hardmask for defect reduction in EUV patterning2025
Area scaling for VTFET contacts2025
Additive interconnect formation2024
Airgap isolation for back-end-of-the-line semiconductor interconnect structure w2024