Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Projection lighting system for semiconductor lithography with an improved heat transfer

Projection lighting system for semiconductor lithography with an improved heat transfer

US Patent 10969699 · Granted Apr 6, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Sanitary furniture to be hung on the wall2025
Field facet system and lithography apparatus2025
Facet mirror for an illumination optical unit of a projection exposure apparatus2023
Method for producing a reflective optical element, reflective optical element, a2022
Sanitary installation2022
Beam reverser module and optical power amplifier having such a beam reverser mod2020
Beam reverser module and optical power amplifier having such a beam reverser mod2020
Method for producing a reflective optical element, reflective optical element, a2020
Cooler for use in a device in a vacuum2019
Optical element module with minimized parasitic loads2019
Optical assembly, projection system, metrology system and EUV lithography appara2018
Positioning unit and apparatus for adjustment of an optical element2018