Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mask blank, phase shift mask, phase shift mask manufacturing method, and semiconductor device manufacturing method

Mask blank, phase shift mask, phase shift mask manufacturing method, and semiconductor device manufacturing method

US Patent 10935881 · Granted Mar 2, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Mask blank, method of manufacturing transfer mask, and method of manufacturing s2025
Mask blank, method of manufacturing transfer mask, and method of manufacturing s2025
Reflective mask blank, reflective mask, and method for manufacturing semiconduct2025
Mask blank, method for manufacturing transfer mask, and method for manufacturing2024
Mask blank, method for manufacturing transfer mask, and method for manufacturing2024
Mask blank, transfer mask, and method for manufacturing semiconductor device2024
Mask blank, method of manufacturing imprint mold, method of manufacturing transf2024
Mask blank, method of manufacturing imprint mold, method of manufacturing transf2024
Mask blank, method for manufacturing reflective mask, and method for manufacturi2023
Mask blank, method for manufacturing reflective mask, and method for manufacturi2023
Mask blank, phase shift mask, and method of manufacturing semiconductor device2023
Mask blank, phase shift mask, and method of manufacturing semiconductor device2023