Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for detecting wafer processing parameters with micro resonator array sensors

Method for detecting wafer processing parameters with micro resonator array sensors

US Patent 10901021 · Granted Jan 26, 2021

Estimated economic value: $35,448,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Physically-informed multi-system hardware operating windows2025
Determining equipment constant updates by machine learning2025
Chamber matching by equipment constant updates2025
Smart camera substrate2025
In-chamber low-profile sensor assembly2025
Substrate measurement subsystem2025
MEMS resonator sensor substrate for plasma, temperature, stress, or deposition s2025
Performing radio frequency matching control using a model-based digital twin2025
Integrated substrate measurement system to improve manufacturing process perform2025
Optical spectrum sensor wafer or robot for chamber condition monitoring2024
Smart camera substrate2024
Hoist and winch cable angle sensor2024