Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for forming a silicon nitride film on a substrate and related semiconductor device structures

Methods for forming a silicon nitride film on a substrate and related semiconductor device structures

US Patent 10892156 · Granted Jan 12, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and apparatus for cleaning a vessel2025
Apparatus for providing a gas mixture to a reaction chamber and method of using 2025
Semiconductor processing device2025
Showerhead assembly and components2025
Methods and systems for forming a layer comprising vanadium and nitrogen2025
Multiple-layer method and system for forming material within a gap2025
Showerhead assembly and components thereof2025
Methods of forming molybdenum-containing films deposited on elemental metal film2025
Manifolds for uniform vapor deposition2025
Substrate susceptor using edge purging2025
Methods and systems for filling a gap2025
Methods and systems for forming a layer comprising aluminum, titanium, and carbo2025