Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Low temperature high-quality dielectric films

Low temperature high-quality dielectric films

US Patent 10840088 · Granted Nov 17, 2020

Estimated economic value: $41,112,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pulsed plasma (DC/RF) deposition of high quality C films for patterning2025
Pulsed plasma (DC/RF) deposition of high quality C films for patterning2025
Pulsed plasma (DC/RF) deposition of high quality C films for patterning2025
Processes for depositing SiB films2025
High density carbon films for patterning applications2025
High density carbon films for patterning applications2025
High density carbon films for patterning applications2025
High density carbon films for patterning applications2025
Electronic device fabrication using area-selective deposition2025
Low temperature graphene growth2025
Methods of forming thermally stable carbon film2025
Methods of forming thermally stable carbon film2025