Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Extreme ultraviolet (EUV) mask absorber and method for forming the same

Extreme ultraviolet (EUV) mask absorber and method for forming the same

US Patent 10768521 · Granted Sep 8, 2020

Estimated economic value: $79,748,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Main beam for wind turbine blade and manufacturing method thereof2024
Methods of performing fin cut etch processes for FinFET semiconductor devices2022
Metering system for calculating real-time profit or loss of gas stations2021
Apparatus and related method to control radiation transmission through mask patt2021
Methods of performing fin cut etch processes for FinFET semiconductor devices2021
Double pass diluted ultraviolet reticle inspection2020
Shielding structures between optical waveguides2020
System and method for analyzing printed masks for lithography based on represent2020
Method for calculating non-correctable EUV blank flatness for blank dispositioni2020
Extreme ultraviolet mirrors and masks with improved reflectivity2019
Stable and reliable FinFET SRAM with improved beta ratio2019
Non-bridging contact via structures in proximity2019