Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Self-limiting selective etching systems and methods

Self-limiting selective etching systems and methods

US Patent 10755941 · Granted Aug 25, 2020

Estimated economic value: $29,525,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Self-aligned wide backside power rail contacts to multiple transistor sources2025
Display substrate and manufacturing method therefor, and display device2025
Selective etching between silicon-and-germanium-containing materials with varyin2025
Selective etching between silicon-and-germanium-containing materials with varyin2025
Semiconductor chamber components with advanced dual layer nickel-containing coat2025
Selective etching of silicon-and-germanium-containing materials with increased s2025
Selective etching of silicon-and-germanium-containing materials with increased s2025
Low temperature graphene growth2025
Multi color stack for self aligned dual pattern formation for multi purpose devi2025
Integration processes utilizing boron-doped silicon materials2025
Integration processes utilizing boron-doped silicon materials2025
Vehicle intelligent unit2025