Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for depositing a silicon nitride film and film deposition apparatus

Method for depositing a silicon nitride film and film deposition apparatus

US Patent 10748758 · Granted Aug 18, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for forming film on substrate surface having convex portion2025
Deposition method and deposition apparatus2025
Method for depositing film and film deposition system2025
Liquid atomizing apparatus2024
Powder conveying device and image forming apparatus incorporating same2024
Plasma processing apparatus2024
Deposition method2024
Deposition method2024
Deposition method2024
Film deposition apparatus and film deposition method2024
Plasma generation apparatus, deposition apparatus using the same, and deposition2023
Transfer bias and pressure in an image forming apparatus2023