Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma processing method including cleaning of inside of chamber main body of plasma processing apparatus

Plasma processing method including cleaning of inside of chamber main body of plasma processing apparatus

US Patent 10714320 · Granted Jul 14, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate processing method and substrate processing apparatus2025
Plasma processing method2024
Etching method and plasma processing apparatus2023
Plasma processing method2023
Substrate processing method, substrate processing apparatus and cleaning apparat2023
Method of etching silicon containing films selectively against each other2022
Plasma processing method including cleaning of inside of chamber main body of pl2022
Plasma processing method including cleaning of inside of chamber main body of pl2022
Etching method and plasma processing apparatus2022
Method of etching silicon containing films selectively against each other2021
Plasma etching method and plasma etching apparatus2020
Mounting table and plasma processing apparatus2020