Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cleaning compositions for removing post etch residue

Cleaning compositions for removing post etch residue

US Patent 10577567 · Granted Mar 3, 2020

Estimated economic value: $41,891,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Selective removal of metal oxide hard masks2025
Selective removal of metal oxide hard masks2025
Nitride etchant composition and method2024
Nitride etchant composition and method2024
Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tun2024
Method for removing hard masks2023
Wet etching composition and method2023
Silicon nitride etching composition and method2023
Electronic device for processing user utterance and controlling method thereof2022
Compositions and methods for selectively etching silicon nitride films2022
Method and composition for etching molybdenum2022
Method and composition for etching molybdenum2022