Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Reduction of surface and embedded substrate charge by controlled exposure to vacuum ultraviolet (VUV) light in low-oxygen environment

Reduction of surface and embedded substrate charge by controlled exposure to vacuum ultraviolet (VUV) light in low-oxygen environment

US Patent 10483010 · Granted Nov 19, 2019

Estimated economic value: $57,608,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Information processing apparatus and control method2025
Formation of self-assembled monolayer for selective etching process2025
Method of fabricating a semiconductor structure and semiconductor structure obta2025
Radical treatment in supercritical fluid for gate dielectric quality improvement2025
Technique for semiconductor manufacturing2025
Semiconductor devices with a rare earth metal oxide layer2024
Gas mixture including hydrogen fluoride, alcohol and an additive for preventing 2023
Unmanned aerial vehicle and drive method2023
Technique for semiconductor manufacturing2022
Etchant composition2022
Method and apparatus for processing wafer-shaped articles2021
Signal transmission device and signal transmission method2020