Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield

Method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield

US Patent 10453703 · Granted Oct 22, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Axial positioning of magnetic poles while producing a silicon ingot2025
Ingot puller apparatus that axially position magnetic poles2025
Use of arrays of quartz particles during single crystal silicon ingot production2025
Thermoplastic resin composition and molded article including the same2025
Method of measuring absorbed dose of radiation in small irradiation fields2025
Camera module2025
ASA-based resin composition, molded article including ASA-based resin compositio2025
Thermoplastic resin composition and exterior material including the same2025
Power transmission apparatus for hybrid vehicle2025
Auxiliary power supply, operating method of the auxiliary power supply and stora2025
Methods for producing a product ingot having low oxygen content2025
Thermoplastic resin composition, method of preparing the same, and molded articl2025