Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods of fabricating semiconductor devices including fin-shaped active regions

Methods of fabricating semiconductor devices including fin-shaped active regions

US Patent 10424503 · Granted Sep 24, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Etchant composition for silicon layer and etching method using the same2025
Method of manufacturing semiconductor device using stationary laser module2025
Apparatus for polishing a wafer and method for fabricating a semiconductor devic2025
Hearing device, and method for adjusting hearing device2024
Etching composition2024
Etching composition2024
Wet etching apparatus2024
Wafer cleaning apparatus and wafer cleaning method using the same2024
Etching composition for metal nitride layer and etching method using the same2024
Semiconductor devices and methods of fabricating the same2024
Silicon nitride film etching composition and etching method using the same2024
Silicon nitride film etching composition and etching method using the same2024