Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for providing lithography features on a substrate by self-assembly of block copolymers

Methods for providing lithography features on a substrate by self-assembly of block copolymers

US Patent 10410914 · Granted Sep 10, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Object table, stage apparatus, holding method and lithographic apparatus2025
Measurement system and method for characterizing a patterning device2025
Imprint lithography2024
Imprint lithography2024
Systems and methods for reducing resist model prediction errors2024
Systems and methods for predicting layer deformation2024
Inspection tool and inspection method2023
Lithographic apparatus, method for unloading a substrate and method for loading 2023
Imprint lithography2023
Imprint lithography2023
Systems and methods for predicting layer deformation2023
Lithographic patterning process and resists to use therein2022