Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems and methods for detecting oxygen in-situ in a substrate area of a substrate processing system

Systems and methods for detecting oxygen in-situ in a substrate area of a substrate processing system

US Patent 10267728 · Granted Apr 23, 2019

Estimated economic value: $38,920,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Vapor cleaning of substrate surfaces2025
Atomic layer treatment process using metastable activated radical species2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2023