Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Layout pattern proximity correction through fast edge placement error prediction

Layout pattern proximity correction through fast edge placement error prediction

US Patent 10254641 · Granted Apr 9, 2019

Estimated economic value: $36,395,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor substrate bevel cleaning2024
Systems for cooling RF heated chamber components2024
Method of etch model calibration using optical scatterometry2023
Method of etch model calibration using optical scatterometry2023
Method of etch model calibration using optical scatterometry2023
Air cooled faraday shield and methods for using the same2023
Resist and etch modeling2023
Control method for variable turbine nozzle of turbocharger during engine braking2023
Multi-zone cooling of plasma heated window2022
Systems for cooling RF heated chamber components2022
Control of on-wafer cd uniformity with movable edge ring and gas injection adjus2022
Internal plasma grid for semiconductor fabrication2021