Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Customized polishing pads for CMP and methods of fabrication and use thereof

Customized polishing pads for CMP and methods of fabrication and use thereof

US Patent 10220487 · Granted Mar 5, 2019

Estimated economic value: $15,657,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Chemical planarization2023
Grooved CMP pads2016
Customized polishing pads for CMP and methods of fabrication and use thereof2016
Customized polishing pads for CMP and methods of fabrication and use thereof2016
Customized polishing pads for CMP and methods of fabrication and use thereof2016
Polishing systems2016
Grooved CMP pad2015
Methods for producing in-situ grooves in chemical mechanical planarization (CMP)2015
Methods for producing in-situ grooves in chemical mechanical planarization (CMP)2015
Customized polishing pads for CMP and methods of fabrication and use thereof2014
Customized polishing pads for CMP and methods of fabrication and use thereof2014
Customized polishing pads for CMP and methods of fabrication and use thereof2014