Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methodology for pattern density optimization

Methodology for pattern density optimization

US Patent 10049178 · Granted Aug 14, 2018

Estimated economic value: $2,753,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods for integrated circuit design and fabrication2025
Semiconductor device and method for manufacturing the same2025
Geometric mask rule check with favorable and unfavorable zones2025
Method of fabricating semiconductor device with reduced trench distortions2025
Method of forming a semiconductor device2025
Display screen with icon2025
Integrated circuit and method of manufacturing same2025
Photovoltaic panel packaging structure and method for the same2025
Pattern fidelity enhancement2025
Semiconductor device including source/drain contact having height below gate sta2025
Semiconductor devices including backside power rails and methods of manufacture2025
Semiconductor device and method of manufacture2025