Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7981309 | Method for detecting polishing end in CMP polishing device, CMP polishing device, and semiconductor device manufacturing method | Takehiko Ueda, Akira Ishikawa | 2011-07-19 |
| 6323952 | Flatness measuring apparatus | Masahiko Yomoto, Eiji Matsukawa, Hironobu Sakuta | 2001-11-27 |