IN

Izumi Nakayama

NG Nihon Shinku Gijutsu: 6 patents #6 of 128Top 5%
NK Nihon Sinku Gijutsu Kabusiki: 2 patents #5 of 21Top 25%
UT Ulvac Technologies: 1 patents #6 of 8Top 75%
VC Vacuum Metallurgical Co.: 1 patents #10 of 16Top 65%
📍 Yokohama, MA: #31 of 47 inventorsTop 70%
Overall (All Time): #526,435 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
5953629 Method of thin film forming on semiconductor substrate Nobuya Imazeki, Masaaki Oda 1999-09-14
5851589 Method for thermal chemical vapor deposition Akitoshi Suzuki, Yoshiro Kusumoto, Kazuo Takakuwa, Tetsuya Ikuta 1998-12-22
5795831 Cold processes for cleaning and stripping photoresist from surfaces of semiconductor wafers Yukio Masuda, Richard L. Bersin, Han Xu, Quain Geng 1998-08-18
5244501 Apparatus for chemical vapor deposition Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko, Yoshiro Kusumoto, Kazuo Takakuwa +1 more 1993-09-14
5125360 Vacuum processing apparatus Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko 1992-06-30
4994301 ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate Yoshiro Kusumoto, Kazuo Takakuwa, Tetsuya Ikuta, Akitoshi Suzuki 1991-02-19
4924807 Apparatus for chemical vapor deposition Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko, Yoshiro Kusumoto, Kazuo Takakuwa +1 more 1990-05-15
4902531 Vacuum processing method and apparatus Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko 1990-02-20
4849260 Method for selectively depositing metal on a substrate Yoshiro Kusumoto, Kazuo Takakuwa, Tetsuya Ikuta, Akitoshi Suzuki 1989-07-18
4800105 Method of forming a thin film by chemical vapor deposition Akitoshi Suzuki, Yoshiro Kusumoto, Kazuo Takakuwa, Tetsuya Ikuta 1989-01-24