Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5851589 | Method for thermal chemical vapor deposition | Izumi Nakayama, Akitoshi Suzuki, Yoshiro Kusumoto, Tetsuya Ikuta | 1998-12-22 |
| 5244501 | Apparatus for chemical vapor deposition | Izumi Nakayama, Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko, Yoshiro Kusumoto +1 more | 1993-09-14 |
| 4994301 | ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate | Yoshiro Kusumoto, Tetsuya Ikuta, Akitoshi Suzuki, Izumi Nakayama | 1991-02-19 |
| 4924807 | Apparatus for chemical vapor deposition | Izumi Nakayama, Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko, Yoshiro Kusumoto +1 more | 1990-05-15 |
| 4849260 | Method for selectively depositing metal on a substrate | Yoshiro Kusumoto, Tetsuya Ikuta, Akitoshi Suzuki, Izumi Nakayama | 1989-07-18 |
| 4800105 | Method of forming a thin film by chemical vapor deposition | Izumi Nakayama, Akitoshi Suzuki, Yoshiro Kusumoto, Tetsuya Ikuta | 1989-01-24 |